Nanoscale, 2013, 5,2600-2615
DOI: 10.1039/C3NR34258A, Feature Article
DOI: 10.1039/C3NR34258A, Feature Article
Giordano Scappucci, Giovanni Capellini, Wolfgang M. Klesse, Michelle Y. Simmons
We achieve controlled doping of germanium for nanoelectronics and photonics by combining atomic layer doping with scanning probe lithography.
The content of this RSS Feed (c) The Royal Society of Chemistry
We achieve controlled doping of germanium for nanoelectronics and photonics by combining atomic layer doping with scanning probe lithography.
The content of this RSS Feed (c) The Royal Society of Chemistry