Nanoscale, 2012, 4,7532-7539
DOI: 10.1039/C2NR32350H, Paper
DOI: 10.1039/C2NR32350H, Paper
Prayudi Lianto, Sihang Yu, Jiaxin Wu, C. V. Thompson, W. K. Choi
Stability of isolated metal catalysts for vertical metal-assisted chemical etching of silicon depends on etch chemistry and catalyst spacing.
The content of this RSS Feed (c) The Royal Society of Chemistry
Stability of isolated metal catalysts for vertical metal-assisted chemical etching of silicon depends on etch chemistry and catalyst spacing.
The content of this RSS Feed (c) The Royal Society of Chemistry