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Atomistic modeling of metallic nanowires in silicon

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Nanoscale, 2013, 5,8666-8674
DOI: 10.1039/C3NR01796F, Paper
Hoon Ryu, Sunhee Lee, Bent Weber, Suddhasatta Mahapatra, Lloyd C. L. Hollenberg, Michelle Y. Simmons, Gerhard Klimeck
Metallic conduction in atomic-scale highly P-doped Si nanowires is theoretically studied using a tight-binding approach coupled to Schrodinger-Poisson simulations. The density of states and spatial distributions of electrons confirm they remain metallic down to the atomic-scale, which bodes well for their utility as ultra-thin metallic interconnects for atomic-scale devices.
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